磁控濺射法沉積TCO薄膜的電源技術
作者：陳宇 廣東志成冠軍集團有限公司 上傳時間：2012/9/14 16:31:42
摘要：電源在磁控濺射法制備透明導電氧化物（TCO）薄膜的技術中起著重要的作用。本文重點介紹了磁控濺射TCO薄膜的電源技術發展現狀及進展，首先簡要說明了目前應用最廣泛的直流電源技術及具備滅弧能力的脈沖電源技術的原理和主要優缺點。進一步的，介紹了具備快速滅弧補償功能的新型直流電源技術和模塊化電源技術。最后進一步分析了代表新一代技術的高功率脈沖磁控濺射（HPPMS）電源的基本原理和優良特性，并指出其發展所面臨的挑戰。
敘詞：TCO薄膜 磁控濺射 電源 HPPMS Abstract：The power source play an important role for magnetron sputtering of the transparent conductive oxides (TCO). This paper introduces the conventional DC power source and pulsed power source for magnetron sputtering of the TCO at first. Then the newly developed modular power source and the DC power source with a fast arc elimination function and an arc compensation technology are introduced. Furthermore, the principle, characteristic and challenge of high power pulsed magnetron sputtering HPPMSpower source which is regarded as the new generation power source of magnetron sputtering is discussed. Keyword：TCO Thin films , Magnetron sputtering , Power source , HPPMS
敘詞：TCO薄膜 磁控濺射 電源 HPPMS Abstract：The power source play an important role for magnetron sputtering of the transparent conductive oxides (TCO). This paper introduces the conventional DC power source and pulsed power source for magnetron sputtering of the TCO at first. Then the newly developed modular power source and the DC power source with a fast arc elimination function and an arc compensation technology are introduced. Furthermore, the principle, characteristic and challenge of high power pulsed magnetron sputtering HPPMSpower source which is regarded as the new generation power source of magnetron sputtering is discussed. Keyword：TCO Thin films , Magnetron sputtering , Power source , HPPMS
說明：本站會員正確輸入用戶名和密碼進行登錄系統后才能查看文章詳細內容和參與評論。
－－本文摘自《電源世界》，已被閱讀129733次
免責聲明：本文僅代表作者個人觀點，與電源在線網無關。其原創性以及文中陳述文字和內容未經本站證實，對本文以及其中全部或者部分內容、文字的真實性、完整性、及時性本站不作任何保證或承諾，請讀者僅作參考，并請自行核實相關內容。
：0755-82905460 郵箱 
：關于本文的網友評論：
本文暫時還沒有網友發表評論信息！
文章檢索